27th International Workshop on Active-Matrix Flatpanel Displays and Devices

Topics: Materials Science, Nanotechnology, Physical Chemistry, Keywords: see below

Date: /1/2/3/4/ September 2020, Kyoto, Japan, Asia

More Information, Contact: secretariat [at] amfpd.jp

Official Information:

Since its inception in 1994, this event has been providing important opportunities for people engaged in the research and development of systems, devices & processes, materials for FPDs (Flat Panel Displays), thin-film devices, and photovoltaics. The active-matrix displays, active devices, and photovoltaics based on thin-film technologies are one of the key devices for facilitating the IT、IoT and sustainable society. There is no doubt that importance of the devices will emphasize well into the future.

Topics:

●Flat Panel Displays (FPD): flexible display, printed display, LCD, OLED, μLED, e-paper, 3D display, virtual reality display, augmented
reality display, high-resolution display, high-definition display, automotive display, novel display, touch screen panel, in-cell technology,
driving technology, circuit technology, display manufacturing, and other FPD technology
●TFT Technologies (TFT): oxide TFTs, organic TFTs, amorphous, microcrystalline and polycrystalline Si-based TFTs, other
material TFTs such as graphene, carbon nanotubes, layered transition metal dichalcogenide, and semiconductor nanowires, device
modeling, device and circuit simulation, reliability, and other TFT technology
●Photovoltaics (PV): thin-film solar cells (Si-based, compound, organic, and perovskite), amorphous/crystalline Si heterojunction,
passivation, transparent conductive oxides and light management, third-generation (quantum dots, interband, plasmon etc.), BIPV,
characterization, reliability, photo-thermal solar energy conversion, and other PV technology
●Thin-Film Materials and Devices (TFMD): thin-film materials (2D materials, and others) and processing, apparatus technology,
wearable sensors, thin-film emerging devices (imaging devices, sensors, and others), thin-film and devices characterizations (structural,
optical and electrical properties), substrate materials and passivation technologies, and other TFMD technology.